THE INFLUENCE OF SILICON ELEMENT-ADDED DLC FILM ON Ti-6Al-4V

IF 0.2 Q4 MULTIDISCIPLINARY SCIENCES
N. Moolsradoo, S. Watanabe
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引用次数: 0

Abstract

Silicon added diamond-like carbon films fabricated from C2H2:TMS mixture were used to study the influence of silicon content on the deposition and tribological properties of films prepared on Ti-6Al-4V substrate by using plasma-based ion implantation (PBII). The structure of the film was analyzed by Raman spectroscopy. Hardness and elastic modulus of the film were measured by nano-indentation hardness tester. Tribological propertiesof the film were performed by using ball-on-disk friction tester. The results indicate that with the increasing silicon content in the pure DLC film, the friction coefficient increases. The hardness and elastic modulus of Si-DLC film can increase to a value of up to 31.1 GPa and 200.1 GPa with a silicon content of 13.1 at.%. This is because the greater C content. The Si-DLC films with Si content of 13.1 at.% (C:Si/1:2) and 14.3 at.% (C:Si/1:6) shows a low friction coefficient of 0.2, which is considerable improvement in the tribological properties. This is due to the high hardness and elastic modulus.
添加硅元素的DLC膜对Ti-6Al-4V的影响
采用等离子体离子注入技术(PBII)在Ti-6Al-4V衬底上制备了添加硅的类金刚石薄膜,研究了硅含量对薄膜沉积和摩擦学性能的影响。用拉曼光谱分析了膜的结构。采用纳米压痕硬度计测定薄膜的硬度和弹性模量。采用球盘式摩擦试验机对膜的摩擦学性能进行了测试。结果表明:随着纯DLC膜中硅含量的增加,摩擦系数增大;当硅含量为13.1%时,Si-DLC薄膜的硬度和弹性模量分别可达31.1 GPa和200.1 GPa。这是因为C含量更高。Si含量为13.1 at的Si- dlc薄膜。% (C:Si/1:2)和14.3 at。% (C:Si/1:6)的摩擦系数较低,为0.2,摩擦学性能有较大改善。这是由于高硬度和弹性模量。
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来源期刊
Suranaree Journal of Science and Technology
Suranaree Journal of Science and Technology MULTIDISCIPLINARY SCIENCES-
CiteScore
0.30
自引率
50.00%
发文量
0
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