Photochemical degradation of oxytetracycline hydrochloride in the presence of H2O2

A. U. Rahmah, S. Harimurti, A. Omar, T. Murugesan
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引用次数: 11

Abstract

Advanced oxidation process (AOPs) are technologies based on the intermediacy of hycroxyl radical and other radicals to oxidize recalcitrant, toxic nad no biodegradable cpmpounds to various by- products. In this paper, Oxytetracycline hydrochloride (OTC) was degraded inside a UV-H2O2 system which utilize hydroxyl radical generated from H2O2 to attack OTC. Concentration of H2O2, temperature and pH was varied in this experiment. To monitor OTC degradation, TOC and UV-VIS spectra analysis were carried out. Constant OTC concentration at 250 ppm was used. About 93.06% of TOC removal was achieved at 40°C and 1 eq mole ratio H2O2 to OTC. After 180 min irradiation, UV-Vis spectra of OTC have shown total disappearance of OTC peak. HPLC analyses has shown about 93.08% of OTC were degraded after 180 min irradiated inside UV-H2O2 system.
H2O2存在下盐酸土霉素的光化学降解
高级氧化过程(AOPs)是利用羟基自由基和其他自由基作为中间体,将难降解的、有毒的、不可生物降解的化合物氧化成各种副产物的技术。本文采用UV-H2O2体系降解盐酸土霉素(OTC),该体系利用H2O2产生的羟基自由基攻击OTC。实验中,H2O2浓度、温度和pH值发生了变化。为了监测OTC的降解,进行了TOC和UV-VIS光谱分析。使用250 ppm恒定OTC浓度。在40℃、H2O2与OTC的摩尔比为1等条件下,TOC去除率约为93.06%。辐照180min后,OTC的紫外可见光谱显示OTC峰完全消失。HPLC分析表明,在UV-H2O2体系中辐照180 min后,OTC降解率约为93.08%。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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