Recent Developments in the X-Ray Reflectivity Analysis for Rough Surfaces and Interfaces of Multilayered Thin Film Materials

Y. Fujii
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引用次数: 9

Abstract

X-ray reflectometry is a powerful tool for investigations on rough surface and interface structures of multilayered thin film materials. The X-ray reflectivity has been calculated based on the Parratt formalism, accounting for the effect of roughness by the theory of Nevot-Croce conventionally. However, in previous studies, the calculations of the X-ray reflectivity often show a strange effect where interference effects would increase at a rough surface. And estimated surface and interface roughnesses from the X-ray reflectivity measurements did not correspond to the TEM image observation results. The strange result had its origin in a used equation due to a serious mistake in which the Fresnel transmission coefficient in the reflectivity equation is increased at a rough interface because of a lack of consideration of diffuse scattering. In this review, a new accurate formalism that corrects this mistake is presented. The new accurate formalism derives an accurate analysis of the X-ray reflectivity from a multilayer surface of thin film materials, taking into account the effect of roughness-induced diffuse scattering. The calculated reflectivity by this accurate reflectivity equation should enable the structure of buried interfaces to be analyzed more accurately.
多层薄膜材料粗糙表面和界面的x射线反射率分析研究进展
x射线反射法是研究多层薄膜材料粗糙表面和界面结构的有力工具。x射线反射率的计算基于Parratt形式,采用Nevot-Croce理论考虑粗糙度的影响。然而,在以前的研究中,x射线反射率的计算经常显示出一种奇怪的效应,即在粗糙的表面上干涉效应会增加。x射线反射率测量估计的表面和界面粗糙度与TEM图像观测结果不一致。这个奇怪的结果源于一个常用的方程,由于没有考虑漫射散射,反射率方程中的菲涅耳透射系数在粗糙的界面处增加,这是一个严重的错误。本文提出了一种新的准确的形式主义,纠正了这一错误。新的精确形式对多层薄膜材料表面的x射线反射率进行了精确的分析,并考虑了粗糙度引起的漫射散射的影响。利用该精确反射率方程计算出的反射率可以更准确地分析埋藏界面的结构。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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