A. Sonnenfeld, T. M. Tun, L. Zajíčková, K. V. Kozlov, H. Wagner, J. Behnke, R. Hippler
{"title":"Deposition Process Based on Organosilicon Precursors in Dielectric Barrier Discharges at Atmospheric Pressure—A Comparison","authors":"A. Sonnenfeld, T. M. Tun, L. Zajíčková, K. V. Kozlov, H. Wagner, J. Behnke, R. Hippler","doi":"10.1023/A:1014414016164","DOIUrl":null,"url":null,"abstract":"","PeriodicalId":20249,"journal":{"name":"Plasmas and Polymers","volume":"115 1","pages":"237-266"},"PeriodicalIF":0.0000,"publicationDate":"2001-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"122","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Plasmas and Polymers","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1023/A:1014414016164","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}