Copper deposition overvoltage on non-renewed and continuously mechanically renewed copper electrode surfaces in the Tafel potential region

Abstract

The copper deposition overvoltage in the Tafel potential region on both non-renewed and continuously mechanically renewed working electrode surfaces in H₂SO₄-CuSO₄ solutions of various compositions (0.06 - 0.75 M CuSO₄ + 2 M H₂SO₄) was studied using a copper self-cleaning rotating electrode. A decrease in the overvoltage on the continuously mechanically renewed electrode surface was observed in the Tafel region for all solution compositions investigated.