Polymerization of spin-casted epoxy films induced by electron beam or UV irradiation

Abstract

Polymerization of spin-casted epoxy oligomer resin-films was initiated by electron beam (EB) or UV irradiation and the conversion to polymer was studied as a function of the thickness of the film. The film thickness was varied from 1 to 25 μm. In the EB-irradiation, the number of oligomer molecules reacted per 100 eV of energy absorption (G-value) increased with increasing thickness up to 10 μm but did not change above this value. In the UV-irradiation, the G-value increased linearly with increasing film thickness. The result was explained by the difference in the penetrating power of the two radiations. The G-values and the quantum yields of the polymerization in the EB- and the UV-irradiations were compared on the basis of the same energy absorbed in the systems; it was found that the EB-irradiation was more effective than the UV-irradiation. Some anomalous polymerization behaviors were observed in thin, spin-casted films.