Varied layer thickness improves structural properties of YSZ thin film

IF 4.2 Q2 NANOSCIENCE & NANOTECHNOLOGY
Nur Fathirah Mohd Rahimi, Sathiabama T. Thirugnana, S. K. Ghoshal, R. Muhammad
{"title":"Varied layer thickness improves structural properties of YSZ thin film","authors":"Nur Fathirah Mohd Rahimi, Sathiabama T. Thirugnana, S. K. Ghoshal, R. Muhammad","doi":"10.1177/23977914211015854","DOIUrl":null,"url":null,"abstract":"In this study, the Yttrium Stabilized Zirconia (YSZ) thin films were deposited on the sapphire substrate (Al2O3) by dip-coating method using simple ethanol-based YSZ suspension. The layer thickness of YSZ films were varied by sintering at 1300°C. Phase change and structural evolution in YSZ films were observed by conducting X-ray diffraction (XRD) analyses. The microstructures and the surface morphology of the deposited films were examined using Atomic Force Microscope (AFM) and Field Emission Scanning Electron Microscope (FESEM). The XRD pattern revealed a phase change from cubic to monoclinic with an increase in YSZ layer thickness. The crystallite size was varied in the range of 9.68–42.98 nm with the changes in the layer thickness. Meanwhile, the AFM image analyses showed a layer thickness-dependent variation in the grain size (205.83–373.77 nm) and the RMS surface roughness (16.72–36.44 nm). The FESEM images of the achieved film exhibited the occurrence of a dense morphology. It was concluded that by controlling the layer thickness of the deposited films, their improved structure and morphology can be achieved.","PeriodicalId":44789,"journal":{"name":"Proceedings of the Institution of Mechanical Engineers Part N-Journal of Nanomaterials Nanoengineering and Nanosystems","volume":"10 1","pages":"49 - 54"},"PeriodicalIF":4.2000,"publicationDate":"2021-05-05","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Proceedings of the Institution of Mechanical Engineers Part N-Journal of Nanomaterials Nanoengineering and Nanosystems","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1177/23977914211015854","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"NANOSCIENCE & NANOTECHNOLOGY","Score":null,"Total":0}
引用次数: 0

Abstract

In this study, the Yttrium Stabilized Zirconia (YSZ) thin films were deposited on the sapphire substrate (Al2O3) by dip-coating method using simple ethanol-based YSZ suspension. The layer thickness of YSZ films were varied by sintering at 1300°C. Phase change and structural evolution in YSZ films were observed by conducting X-ray diffraction (XRD) analyses. The microstructures and the surface morphology of the deposited films were examined using Atomic Force Microscope (AFM) and Field Emission Scanning Electron Microscope (FESEM). The XRD pattern revealed a phase change from cubic to monoclinic with an increase in YSZ layer thickness. The crystallite size was varied in the range of 9.68–42.98 nm with the changes in the layer thickness. Meanwhile, the AFM image analyses showed a layer thickness-dependent variation in the grain size (205.83–373.77 nm) and the RMS surface roughness (16.72–36.44 nm). The FESEM images of the achieved film exhibited the occurrence of a dense morphology. It was concluded that by controlling the layer thickness of the deposited films, their improved structure and morphology can be achieved.
不同的层厚可以改善YSZ薄膜的结构性能
在本研究中,使用简单的乙醇基YSZ悬浮液,采用浸涂法将钇稳定的氧化锆(YSZ)薄膜沉积在蓝宝石衬底(Al2O3)上。在1300℃下烧结,改变了YSZ薄膜的层厚。通过x射线衍射(XRD)分析,观察了YSZ薄膜的相变和结构演变。采用原子力显微镜(AFM)和场发射扫描电镜(FESEM)对沉积膜的微观结构和表面形貌进行了观察。XRD谱图显示,随着YSZ层厚度的增加,材料由立方相转变为单斜相。随着层厚的变化,晶粒尺寸在9.68 ~ 42.98 nm之间变化。同时,AFM图像分析显示,晶粒尺寸(205.83 ~ 373.77 nm)和RMS表面粗糙度(16.72 ~ 36.44 nm)随层厚变化。所得薄膜的FESEM图像显示出致密形态的出现。结果表明,通过控制薄膜的厚度,可以改善薄膜的结构和形貌。
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来源期刊
CiteScore
6.00
自引率
1.70%
发文量
24
期刊介绍: Proceedings of the Institution of Mechanical Engineers Part N-Journal of Nanomaterials Nanoengineering and Nanosystems is a peer-reviewed scientific journal published since 2004 by SAGE Publications on behalf of the Institution of Mechanical Engineers. The journal focuses on research in the field of nanoengineering, nanoscience and nanotechnology and aims to publish high quality academic papers in this field. In addition, the journal is indexed in several reputable academic databases and abstracting services, including Scopus, Compendex, and CSA's Advanced Polymers Abstracts, Composites Industry Abstracts, and Earthquake Engineering Abstracts.
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