Effect of Sneak Path Current in TiOx/HfOx Based 1S1R RRAM Crossbar Memory Array

Amr Nabil Youssef, Arya Lekshmi Jagath, Nandha Kumar Thulasiraman, H. Almurib
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引用次数: 1

Abstract

In this work, an electrical model of one Selector-one Resistor (1S1R) memory cell structure consisting of a Pt/Ta2O5/TaOx/TiO2/Pt multi-layer selector and a TiN/TiOx/HfOx/Pt Resistive-RAM (RRAM) is proposed. 1S1R and One Resistor (1R) crossbars of sizes up to 128x128 are designed and simulated using CADENCE Virtuoso. The proposed 1S1R crossbars reduce the sneak path current by up to 99.8%, the voltage drops across the crossbars' lines by up to 97.2% and the total current consumption during writing by up to 98.4%, whilst the unselected cells' states remain unaffected. The effect of the crossbars' size and the writing scheme on the 1S1R performance is comprehensively evaluated in this work. In addition, the read Ion/Ioff ratio is substantially increased. The proposed 1S1R structure can reach relatively large crossbar sizes without sacrificing power efficiency and reliability. Thus, the proposed structure offers the potential to be utilized in implementing high-density RRAM memories.
基于TiOx/HfOx的1S1R RRAM交叉棒存储器阵列中潜行路径电流的影响
本文提出了一种由Pt/Ta2O5/TaOx/TiO2/Pt多层选择器和TiN/TiOx/HfOx/Pt电阻式ram (RRAM)组成的一选择器一电阻(1S1R)存储单元结构的电学模型。使用CADENCE Virtuoso设计和模拟尺寸高达128x128的1S1R和One Resistor (1R)横条。所提出的1S1R横条将潜行路径电流降低了99.8%,横条线上的电压下降了97.2%,写入过程中的总电流消耗降低了98.4%,而未选择的电池状态不受影响。本文综合评价了横条尺寸和书写方式对1S1R性能的影响。此外,读取离子/ off比大大增加。提出的1S1R结构可以在不牺牲功率效率和可靠性的情况下达到相对较大的横条尺寸。因此,所提出的结构提供了用于实现高密度RRAM存储器的潜力。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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