Reduction of Thermal Caused Extra Light Induced Degradation by Redefined Regeneration Conditions

Chun-Ping Lin, Kuo-Yi Yen, Jun-Rui Huang, Sean H. T. Chen
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Abstract

The regeneration process is a method for boronoxygen defects passivation by using heat and illumination, and its benefits have been demonstrated for efficiently reducing light induced degradation (LID) on P-type cells. It is widely used for solving LID issue on p-type PERC cells in recent year. In this paper, post-heating was used to understand the thermal influence on regenerated cells. Comparison between cell with and without regeneration process, the post-heating caused extra LID (2%) in regenerated cells is much higher than that (0.5%) in as-fired cells. The difference of extra LID between as-fired and regenerated cells indicates that the post-heating results in defect state transition from regenerated state to annealed state in regenerated cells. Based on this phenomenon, the LID test must take the impact of latent heat after regeneration process such as subsequent module process into consideration. Therefore, the regeneration process windows of temperature and light intensity need to be redefined when post-heating is introduced after regeneration process. The result of process window redefinition shows that the regeneration conditions of 1.4C suns light intensity can reduce the post-heating caused extra LID about 0.8% as compared with the regeneration conditions of 1C suns light intensity, and LID has no significant change as temperature of regeneration condition in a range from 225 °C to 275 °C. Additionally, cells with regeneration condition of 175 °C have low as regenerated efficiency, and the LID of cells with regeneration treatment at 300 °C is higher than that of cells treated with lower temperatures.
通过重新定义再生条件减少热引起的额外光诱导降解
再生过程是一种利用热和光照进行硼氧缺陷钝化的方法,其优点已被证明可以有效地减少p型电池的光诱导降解(LID)。近年来,它被广泛用于解决p型PERC电池的LID问题。本文采用后加热的方法来了解热对再生细胞的影响。经过和未经过再生处理的细胞比较,再生细胞的后加热产生的额外LID(2%)远高于未经过再生处理的细胞(0.5%)。煅烧和再生电池的额外LID差异表明,后加热导致再生电池的缺陷状态从再生状态转变为退火状态。基于这一现象,LID试验必须考虑再生过程后潜热的影响,如后续模块过程。因此,在再生过程后引入后加热时,需要重新定义温度和光强的再生过程窗口。工艺窗口重新定义结果表明,与1C太阳光强的再生条件相比,1.4C太阳光强的再生条件可减少后加热造成的额外LID约0.8%,并且在225℃~ 275℃范围内,LID随再生条件温度变化不显著。175℃再生条件下细胞的再生效率较低,300℃再生条件下细胞的LID高于低温条件下细胞的LID。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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