Degradation of organic pollutants in photocatalytic reactors

A. Ujhidy, E. Szabó-Bárdos, O. Horváth, A. Horváth, K. Schmidt
{"title":"Degradation of organic pollutants in photocatalytic reactors","authors":"A. Ujhidy, E. Szabó-Bárdos, O. Horváth, A. Horváth, K. Schmidt","doi":"10.1515/452","DOIUrl":null,"url":null,"abstract":"Titanium dioxide-mediated photocatalytic mineralization of oxalic acid and formic acid as model compounds were studied in a laboratory-scale reactor and in a pilot equipment to promote the development of procedures for wastewater treatment. Experimental results obtained by using various TiO2 catalysts indicate that the adsorption of the pollutant substrates on the surface of the semiconductor particles is not directly correlated with the specific surface area of the adsorbent. The initial rate of the photocatalytic degradation of the model compounds is enhanced by increasing the adsorption capability of the titanium dioxide applied, but the overall mineralization efficiency is jointly determined by several factors such as the crystal structure, the mean value and the distribution of the particle size, as well as the number of the hydroxyl groups on the particle surface. The VP P90 TiO2 proved to be the most efficient photocatalyst for degradation of both model compounds studied. Application of static mixer in the pilot equipment enhanced the rate of the photocatalytic mineralization of formic acid by about 27%. This effect can be attributed to the increased interfacial mass transfer facilitating the movement of photogenerated HO● radicals from the catalyst surface or the boundary layer to the bulk solution.","PeriodicalId":13010,"journal":{"name":"Hungarian Journal of Industrial Chemistry","volume":null,"pages":null},"PeriodicalIF":0.0000,"publicationDate":"2011-09-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Hungarian Journal of Industrial Chemistry","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1515/452","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 1

Abstract

Titanium dioxide-mediated photocatalytic mineralization of oxalic acid and formic acid as model compounds were studied in a laboratory-scale reactor and in a pilot equipment to promote the development of procedures for wastewater treatment. Experimental results obtained by using various TiO2 catalysts indicate that the adsorption of the pollutant substrates on the surface of the semiconductor particles is not directly correlated with the specific surface area of the adsorbent. The initial rate of the photocatalytic degradation of the model compounds is enhanced by increasing the adsorption capability of the titanium dioxide applied, but the overall mineralization efficiency is jointly determined by several factors such as the crystal structure, the mean value and the distribution of the particle size, as well as the number of the hydroxyl groups on the particle surface. The VP P90 TiO2 proved to be the most efficient photocatalyst for degradation of both model compounds studied. Application of static mixer in the pilot equipment enhanced the rate of the photocatalytic mineralization of formic acid by about 27%. This effect can be attributed to the increased interfacial mass transfer facilitating the movement of photogenerated HO● radicals from the catalyst surface or the boundary layer to the bulk solution.
光催化反应器中有机污染物的降解
在实验室规模的反应器和中试设备上研究了二氧化钛介导的草酸和甲酸作为模型化合物的光催化矿化,以促进废水处理工艺的发展。采用多种TiO2催化剂所获得的实验结果表明,污染物底物在半导体颗粒表面的吸附与吸附剂的比表面积没有直接关系。模型化合物的初始光催化降解速率通过增加所施加的二氧化钛的吸附能力而提高,但整体矿化效率是由晶体结构、粒径的平均值和分布以及颗粒表面羟基的数量等几个因素共同决定的。VP P90 TiO2被证明是降解两种模型化合物最有效的光催化剂。静态混合器在中试装置中的应用使甲酸光催化矿化率提高了27%左右。这种效应可以归因于界面传质的增加,促进了光生成的HO●自由基从催化剂表面或边界层向体溶液的移动。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 求助全文
来源期刊
自引率
0.00%
发文量
0
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术官方微信