Properties of CdTe films formed by compound vacuum evaporation

M.B. Winn, L.E. Lyons
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引用次数: 5

Abstract

CdTe thin films formed by compound evaporation onto glass substrates, held at between 40 and 460°C, exhibited abrupt changes of physical properties at ca. 270°C. The resistivity changed from 0.1 ω m to 100 kω m, and a marked increase in crystallinity and absorption edge sharpness was noted. These changes resulted from a decrease in the free tellurium content of the films at ca. 270°C.

复合真空蒸发制备碲化镉薄膜的性能
当温度保持在40 ~ 460℃之间时,在玻璃衬底上形成的碲化镉薄膜的物理性质在270℃左右发生突变。电阻率从0.1 ω m增加到100 km ω m,结晶度和吸收边缘锐度明显增加。这些变化是由于在约270°C时薄膜的游离碲含量减少所致。
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