Applications of imaging techniques to Si, Cu(In,Ga)Se2, and CdTe and correlation to solar cell parameters

S. Johnston, I. Repins, N. Call, R. Sundaramoorthy, K. Jones, B. To
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引用次数: 11

Abstract

Characterization by imaging has been performed on various sets of Si, Cu(In,Ga)Se2 (CIGS), and CdTe solar cell samples. The imaging techniques include photoluminescence (PL) imaging, electroluminescence (EL) imaging, reverse-bias EL imaging (ReBEL), illuminated lock-in thermography (ILIT), and forward- and reverse-bias dark lock-in thermography (DLIT). PL imaging of Si has shown that the image intensity correlates to minority-carrier lifetime. PL imaging of CIGS shows brightness variations after the deposition of the CIGS that persist through the CdS deposition and subsequent processing steps to finish the devices. The PL and EL intensities on both Si and CIGS finished cells correlate to efficiency and open-circuit voltage. Also, for all materials, PL and EL imaging show dark areas due to carrier recombination induced by defects. These same areas often appear in ILIT, DLIT, and ReBEL as heated areas or breakdown sites where currents flow through weak diodes, shunts, and defects. For Si cells, we have correlated the cells' fill factors to the amount of shunting detected by DLIT. For CIGS cells, we have identified these detrimental weak diodes and shunts by imaging and show an example of a defect analyzed in more detail by scanning electron microscopy techniques using top view and cross-sectional imaging.
Si, Cu(In,Ga)Se2和CdTe成像技术的应用及其与太阳能电池参数的相关性
在不同的Si, Cu(In,Ga)Se2 (CIGS)和CdTe太阳能电池样品上进行了成像表征。成像技术包括光致发光(PL)成像,电致发光(EL)成像,反向偏置EL成像(ReBEL),照明锁定热成像(ILIT),以及正向和反向偏置暗锁定热成像(DLIT)。硅的PL成像表明,成像强度与少数载流子寿命相关。CIGS的PL成像显示了CIGS沉积后的亮度变化,这种变化通过cd沉积和后续处理步骤来完成器件。硅和CIGS成品电池上的PL和EL强度与效率和开路电压相关。此外,对于所有材料,由于缺陷引起的载流子重组,PL和EL成像显示暗区。这些相同的区域经常出现在ILIT, DLIT和ReBEL中,作为加热区域或击穿部位,电流流过弱二极管,分流器和缺陷。对于Si细胞,我们已经将细胞的填充因子与DLIT检测到的分流量相关联。对于CIGS细胞,我们通过成像确定了这些有害的弱二极管和分流器,并通过扫描电子显微镜技术使用顶视图和横断面成像展示了一个更详细分析缺陷的例子。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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