Next-generation Packaging Enabled by an Engineered Copper Nanomaterial

R. Stoltenberg, Alexander Capanzana, Agustin Vega, Nhi T. Ngo, Reynaldo Joven, Lian Zhenggang, C. Gan, Y. Lam, A. Zinn
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Abstract

Current and next-generation high power devices require a new set of materials with higher electrical and thermal conductivity to efficiently spread and remove increased waste heat. Kuprion's ActiveCopper technology enables the formation of bulk copper joints at typical soldering temperatures, yet the resulting interconnects are stable up to 500°C or more. This technology has been developed for a number of applications including die attach, thermal vias, and a replacement for WCu heat spreaders. Die attach materials can be dispensed, screened, or stenciled like traditional solder pastes followed by a solder-like thermal profile in a reflow oven under an inert atmosphere. Sintering can be achieved with or without pressure. Thermal vias are generated by stenciling an ActiveCopper paste directly into open circuit board cavities up to 4 mm in diameter followed by hot pressing under conditions similar to those used for traditional PCB manufacture. The resulting copper vias have thermal conductivity up to 330 W/mK, are solder compatible with or without further surface finish, and show excellent bonding to electroplated copper on the via sidewalls. Near net shape heat spreaders akin to WCu or AlSiC can also be generated via hot pressing or injection molding. The CTE of vias and spreaders can be tuned by adjusting the formulation of the original paste. ActiveCopper technology enables the design of all-Copper systems that can handle the increased thermal demands of next-generation electronics while avoiding failure modes attributed to intermetallic formation. Copper also presents an advantage over silver-based systems which show increased migration, dendritic growth, and voiding under higher thermal and electrical loads.
由工程铜纳米材料实现的下一代封装
当前和下一代高功率器件需要一套具有更高导电性和导热性的新材料,以有效地传播和去除增加的废热。Kuprion的activeccopper技术可以在典型的焊接温度下形成大块的铜接头,而最终的互连在高达500°C或更高的温度下仍然稳定。该技术已被开发用于许多应用,包括模具连接,热通孔和WCu散热器的替代品。模具附着材料可以像传统的焊膏一样进行分配,筛选或模压,然后在惰性气氛下的回流炉中形成类似焊料的热轮廓。有压力或无压力均可烧结。热过孔是在类似于传统PCB制造的条件下,将activeccopper膏体直接模压到直径达4mm的开放电路板腔中,然后进行热压,从而产生的。由此产生的铜通孔的导热系数高达330 W/mK,无论是否进行进一步的表面处理,都具有焊料兼容性,并且与通孔侧壁上的电镀铜具有良好的粘合性。类似于WCu或AlSiC的近净形状散热器也可以通过热压或注塑成型产生。通过调整原膏体的配方,可以调整过孔和散布器的CTE。activeccopper技术使全铜系统的设计能够应对下一代电子产品日益增长的热需求,同时避免金属间形成导致的失效模式。铜也表现出优于银基系统的优势,在更高的热和电负载下,银基系统表现出更多的迁移、枝晶生长和空穴。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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