Microstructure and phase composition of ZrN/SiNx multilayered coatings formed by reactive magnetron deposition

V. Uglov, S. Zlotski, I. A. Solodukhin, A. A. Malashevich
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引用次数: 1

Abstract

In the present work, the microstructure and phase composition of multilayered nanoscaled ZrN/SiNx coatings with different thicknesses of individual ZrN and SiNx layers were investigated. The results of transmission electron microscopy (HRTEM) showed that multilayer ZrN/SiNx coatings formed by reactive magnetron deposition are alternating layers of ZrN and SiNx. The X-ray reflectometry (XRR) method made it possible to determine the density, thickness, and surface roughness of individual ZrN and SiNx layers. X-ray diffraction analysis showed that ZrN and SiNx layers have a crystalline and amorphous structure, respectively. The phase composition of mononitride ZrN coatings is characterized by the presence ZrN phase with preferential orientation (111). Phase composition results indicate a change in the preferential orientation from (111) observed for the mononitride ZrN films, to (200) forming in the multilayered ZrN/SiNx coatings.
反应磁控管沉积ZrN/SiNx多层镀层的显微组织和相组成
本文研究了不同厚度ZrN和SiNx单层纳米ZrN/SiNx涂层的微观结构和相组成。透射电镜(HRTEM)结果表明,反应磁控管沉积形成的多层ZrN/SiNx涂层是ZrN和SiNx的交替层。x射线反射法(XRR)可以测定单个ZrN和SiNx层的密度、厚度和表面粗糙度。x射线衍射分析表明,ZrN和SiNx层分别具有结晶和非晶结构。单氮化ZrN涂层的相组成特点是存在择优取向的ZrN相(111)。相组成结果表明,在单层ZrN/SiNx涂层中,优先取向从(111)转变为(200)。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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