Microwave Plasma Source for the Negative Hydrogen Ion Production

M. Mozjetchkov, T. Takanashi, Y. Oka, K. Tsumori, M. Osakabe, O. Kaneko, Y. Takeiri, T. Kuroda
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引用次数: 11

Abstract

Microwave plasma source for the negative hydrogen ion production was constructed and tested. The plasma source consists of two chambers: a plasma production chamber and a plasma confinement chamber. The production chamber is placed into the strong axial magnetic field and the microwaves (2.45 GHz, up to 5 kW) are introduced through the quartz window along the magnetic field lines. It is found that the suppression of the fast electron loss to the window holder is important to improve the efficiency of hydrogen plasma production. The plasma density increases with the magnetic field strength in the plasma production chamber. For the microwave power of 4 kW the uniform plasma of 3×1012 cm−3 for argon and 3×1011 cm−3 for hydrogen is obtained in the area of 20×20 cm. Electron temperature in the plasma grid region is around 2 eV. The optimum gas pressure is around 6 mTorr.
产生负氢离子的微波等离子体源
建立了微波等离子体源产生负氢离子并进行了试验。等离子体源由两个腔室组成:等离子体产生腔室和等离子体约束腔室。生产室置于强轴向磁场中,微波(2.45 GHz,最高5 kW)沿磁力线通过石英窗引入。研究发现,抑制窗架的快速电子损失对提高氢等离子体生产效率具有重要意义。等离子体密度随磁场强度的增大而增大。在4 kW的微波功率下,在20×20 cm的区域内,氩和氢分别获得了3×1012 cm−3和3×1011 cm−3的均匀等离子体。等离子体栅区的电子温度约为2ev。最佳气体压力为6mtorr左右。
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