Rapid device prototyping using the CORNERSTONE platform (Conference Presentation)

C. Littlejohns, Ying Tran, H. Du, S. Stankovic, Xingzhao Yan, G. Sharp, M. Sorel, R. Webb, Jonathon England, H. Chong, F. Gardes, D. Thomson, G. Mashanovich, G. Reed
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引用次数: 2

Abstract

The field of silicon photonics has expanded rapidly over the past several decades. This has led to a degree of standardisation in the commercial device fabrication foundries that are available for universities and fabless companies alike. Whilst this is advantageous in terms of yield, repeatability etc., it is not conducive for researchers to develop new and novel devices for future systems. CORNERSTONE offers researchers a flexible device prototyping capability that can support photonics research around the world. The CORNERSTONE project (Capability for OptoelectRoNics, mEtamateRialS, nanoTechnOlogy, aNd sEnsing) is a UK Engineering and Physical Sciences Research Council (EPSRC) funded project between 3 UK universities: University of Southampton, University of Glasgow and University of Surrey. The project is based on deep-ultraviolet (DUV) photolithography equipment, installed at the University of Southampton, centred around a 248 nm Scanner, the first of its kind in a UK university. Utilising these facilities, CORNERSTONE will offer a multi-project wafer (MPW) service on several silicon-on-insulator (SOI) platforms (220 nm, 340 nm & 500 nm) for both passive and active silicon photonic devices. This talk will give an overview of the CORNERSTONE project, present some of its early data, and summarise future MPW offerings.
使用CORNERSTONE平台的快速设备原型设计(会议报告)
硅光子学领域在过去的几十年里发展迅速。这导致了商业设备制造代工厂的一定程度的标准化,这些代工厂适用于大学和无晶圆厂公司。虽然这在产量、可重复性等方面是有利的,但不利于研究人员为未来的系统开发新的设备。CORNERSTONE为研究人员提供了灵活的设备原型设计能力,可以支持世界各地的光子学研究。CORNERSTONE项目(光电、超材料、纳米技术和传感能力)是由英国工程和物理科学研究委员会(EPSRC)资助的3所英国大学:南安普顿大学、格拉斯哥大学和萨里大学。该项目基于深紫外(DUV)光刻设备,安装在南安普顿大学,围绕248纳米扫描仪,这是英国大学的第一个此类设备。利用这些设施,CORNERSTONE将在几种绝缘体上硅(SOI)平台(220 nm、340 nm和500 nm)上为无源和有源硅光子器件提供多项目晶圆(MPW)服务。本讲座将概述CORNERSTONE项目,介绍其早期数据,并总结未来的MPW产品。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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