Diffusion noise in double injection diodes

C. Huang , A. Van Der Ziel
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引用次数: 6

Abstract

A survey is given of calculations on diffusion noise in double injection SCL diodes. A general asymptotic method applicable to ωτ ⪢ 1 is presented that gives thermal noise at all points in the device. The method of Zijlstra and Gisolf is shown to be non-applicable to the semiconductor regime. For the insulator regime it does not seem to give thermal noise at all points in the device. The method of variation of parameters, when applied to the semiconductor regime, leads to a solution with an unknown integration constant; when this integration constant is chosen zero, one obtains thermal noise plus a g-r like diffusion noise term. Finally an approach is made for the semiconductor regime that does not neglect diffusion. The device then gives thermal noise at all frequencies and at all points in the device, plus a g-r like noise term that is negligible for long devices but noticeable for small ones.

双注入二极管中的扩散噪声
本文综述了双注入式超细l二极管扩散噪声的计算方法。提出了一种适用于ωτ⪢1的一般渐近方法,该方法给出了器件中所有点的热噪声。Zijlstra - Gisolf方法不适用于半导体领域。对于绝缘体制度,它似乎不给热噪声在设备的所有点。当将参数变分法应用于半导体体系时,会得到一个积分常数未知的解;当这个积分常数被选为0时,我们得到热噪声加上一个类似g-r的扩散噪声项。最后提出了一种不忽略扩散的半导体体系的方法。然后,该设备在所有频率和设备的所有点上发出热噪声,加上一个类似g-r的噪声项,对于长设备可以忽略不计,但对于小型设备则可以注意到。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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