Anodic oxidation of aluminium in sulphuric acid under potentiostatic conditions

T. Muramaki, H.R. Khan, Ch.J. Raub
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引用次数: 3

Abstract

The behaviour of the current and impedance have been investigated at low potentials and temperatures by means of a potentiostatic technique for the initial anodic oxidation of aluminium in sulphuric acid. A linear relationship between the reciprocal capacitance and the oxide over potential was obtained and found to be independent of temperature. However, the resistance of the oxide films was temperature dependent. It increases with increasing electrical field. A deviation from an exponential relationship between the current and the potential was found at lower potentials. The experimental data obtained indicate that the initial growth of the pores of the oxide films depends on the applied electrical field strength. A deviation from the empirical exponential relationship between the ionic current and the electrical field strength for the barrier type film is a characteristic of the porous type film in the region of low oxide over potentials.

恒电位条件下铝在硫酸中的阳极氧化
用恒电位法研究了铝在硫酸中初始阳极氧化时的电流和阻抗在低电位和低温度下的行为。得到了倒数电容与氧化物过电位之间的线性关系,并且发现该关系与温度无关。然而,氧化膜的电阻与温度有关。它随着电场的增大而增大。在较低电位处发现电流和电位之间偏离指数关系。实验数据表明,氧化膜孔隙的初始生长与外加电场强度有关。离子电流与电场强度之间的经验指数关系的偏离是多孔型薄膜在低氧化物过电位区域的一个特征。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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