{"title":"Optical and Electrical Properties of Antimony and Fluorine Doped Tin Oxide Thin Films","authors":"S. Oo, Zayar Thu, Than Zaw Oo, P. Kaung","doi":"10.13189/UJPA.2017.110304","DOIUrl":null,"url":null,"abstract":"The Sb:F:SnO 2 layers (AR) were prepared by spray pyrolysis method. The anti-reflective layers (AR) heat-treated at 500℃ for 30 min (solution amount 20 cc and 25 cc) have shown an improved crystallinity with crystallite size of 38-39 nm, high optical transmission of around 70 % at 450 nm. Incorporation of anti-reflective layer at cathode interface of SiO 2 /Si(N) devices increased the power conversion efficiency from 1.2% to 2.7% which is mainly contributed from photocurrent enhancement. The enhanced efficiency mainly contributed to the increase in J sc . It is attributed to enhanced light absorption and better charge transport in the SiO 2 /Si (N) device with Sb:F:SnO 2 AR layer. Results of optical and electrical studies show that the films are well suited for thin film solar cell as a window layer.","PeriodicalId":23443,"journal":{"name":"Universal Journal of Physics and Application","volume":"7 1","pages":"91-96"},"PeriodicalIF":0.0000,"publicationDate":"2017-06-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"2","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Universal Journal of Physics and Application","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.13189/UJPA.2017.110304","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 2
Abstract
The Sb:F:SnO 2 layers (AR) were prepared by spray pyrolysis method. The anti-reflective layers (AR) heat-treated at 500℃ for 30 min (solution amount 20 cc and 25 cc) have shown an improved crystallinity with crystallite size of 38-39 nm, high optical transmission of around 70 % at 450 nm. Incorporation of anti-reflective layer at cathode interface of SiO 2 /Si(N) devices increased the power conversion efficiency from 1.2% to 2.7% which is mainly contributed from photocurrent enhancement. The enhanced efficiency mainly contributed to the increase in J sc . It is attributed to enhanced light absorption and better charge transport in the SiO 2 /Si (N) device with Sb:F:SnO 2 AR layer. Results of optical and electrical studies show that the films are well suited for thin film solar cell as a window layer.