Использование сканирующей зондовой литографии для формирования планарных микрочастиц с конфигурационной анизотропией

Abstract

The experimental results of the formation of polymer masks for the creation of planar microparticles of a given shape by scanning probe lithography are presented. The problems associated with the nonlinearity of the probe movement during the mask formation are considered. The possibility of increasing the lifetime of the probe by changing the mask formation procedure and (or) changing the sample temperature has been demonstrated. Improving the quality of the resulting mask is achieved through the use of chemical etching.