Activation characterization of a novel quinary alloy Ti-Zr-V-Hf-Nb non-evaporable getters by x-ray photoelectron spectroscopy.

Jie Wang, Yong Gao, Yaocheng Hu, Jing Zhang, Z. You, Q. Sun, Q. Si, Zhanglian Xu, Sheng Wang, Guoming Liu, Aijun Mi
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引用次数: 1

Abstract

The first results on the activation process and mechanisms of novel quinary alloy Ti-Zr-V-Hf-Nb non-evaporable getter (NEG) film coatings with copper substrates were presented. About 1.075 µm of Ti-Zr-V-Hf-Nb NEG film coating was deposited on the copper substrates by using the DC sputtering method. The NEG activation at 100, 150, and 180 °C, respectively, for 2 h was in situ characterized by x-ray photoelectron spectroscopy (XPS). The as-deposited NEG film mainly comprised the high valence state metallic oxides and the sub-oxides, as well as a small number of metals. The in situ XPS studies indicated that the concentrations of the high-oxidized states of Ti, Zr, V, Hf, and Nb gradually decreased and that of the lower valence metallic oxides and metallic states increased in steps, when the activation temperature increased from 100 to 180 °C. This outcome manifested that these novel quinary alloy Ti-Zr-V-Hf-Nb NEG film coatings could be activated and used for producing ultra-high vacuum.
新型五元合金Ti-Zr-V-Hf-Nb不可蒸发吸收剂的x射线光电子能谱活化表征。
本文首次研究了新型五合金Ti-Zr-V-Hf-Nb不蒸发吸气剂(NEG)膜在铜基体上的活化过程和机理。采用直流溅射法制备了约1.075µm的Ti-Zr-V-Hf-Nb NEG薄膜涂层。用x射线光电子能谱(XPS)对NEG分别在100、150和180℃下活化2 h进行了原位表征。沉积的NEG膜主要由高价态金属氧化物和亚氧化物组成,还有少量金属。原位XPS研究表明,随着活化温度从100℃升高到180℃,高氧化态Ti、Zr、V、Hf和Nb的浓度逐渐降低,低价态金属氧化物和金属态的浓度逐步增加。这一结果表明,这些新型的五元合金Ti-Zr-V-Hf-Nb - NEG薄膜涂层可以活化并用于超高真空的生产。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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