Experimental investigation of temperature dependent RF performances of RF-CMOS devices

S.M. Nam, B. Lee, S. Hong, C.G. Yu, J. Park, H. Yu
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引用次数: 5

Abstract

This paper presents the degradation of f/sub T/ and f/sub max/ in CMOS devices at elevated temperature. Since MOS transistors in RF applications are usually in saturation region and f/sub T/ of CMOS devices is proportional to g/sub m/, a simple empirical model for temperature dependence of g/sub m/ at any measurement bias has been suggested by considering the temperature dependence of carrier mobility and a saturation velocity simultaneously. From the empirical temperature behavior of g/sub m/, we can predict the enhanced RF performances of CMOS at low temperature.
RF- cmos器件温度相关射频性能的实验研究
本文介绍了CMOS器件在高温下f/sub T/和f/sub max/的衰减。由于射频应用中的MOS晶体管通常处于饱和区,而CMOS器件的f/sub T/与g/sub m/成正比,因此通过同时考虑载流子迁移率和饱和速度的温度依赖性,提出了在任何测量偏置下g/sub m/温度依赖性的简单经验模型。根据g/sub / m/的经验温度行为,我们可以预测CMOS在低温下射频性能的增强。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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