X-ray diffraction investigations on Au/Si alloy films

W. Fischer , P. Wissmann, H. Zitzmann
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引用次数: 5

Abstract

Gold/silicon binary mixtures are prepared by depositing thin gold films onto Si(111) single crystals and subsequently annealing at various temperatures. The structure of the films is studied in situ with the help of an ultra-high-vacuum X-ray diffraction chamber. After deposition at room temperature the gold films are homogeneous with a plane-parallel morphology. After annealing at 630 K the Au 111 peak suddenly disappears in the X-ray spectrum indicating that a eutectic melt has been formed. Cooling leads to a regeneration of the peak at 590 K. This temperature is distinctly smaller than the eutectic temperature reported in the literature (643 K). Obviously small gold islands are formed which are embedded into the silicon surface.

Au/Si合金薄膜的x射线衍射研究
金/硅二元混合物是通过在Si(111)单晶上沉积薄金薄膜并随后在不同温度下退火来制备的。利用超高真空x射线衍射室对薄膜的结构进行了原位研究。在室温下沉积后,金膜呈均匀的平面平行形貌。在630 K退火后,Au 111峰在x射线光谱中突然消失,表明共晶熔体已经形成。冷却导致590 K时峰值的再生。这一温度明显低于文献报道的共晶温度(643 K)。显然,硅表面形成了嵌入的小金岛。
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