Effects of applied stress on the dielectric properties of PLZT thin films

W. Paradise, F. Wang, G. Haertling
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引用次数: 4

Abstract

The dielectric properties of electrooptic thin films were varied by altering the stresses placed upon the films. Selected thin films in the lanthanum-modified lead zirconate titanate system (PLZT) were produced by using the dip-coating process and applying various stresses. Comparisons were made among thin films under mechanically applied stresses of different magnitude. Properties measured were dielectric constant, saturation polarization, remanent polarization, coercive field and d-spacing. The effects of the applied stresses on the physical and electrical properties of the films are discussed.
外加应力对PLZT薄膜介电性能的影响
电光薄膜的介电性能通过改变施加在薄膜上的应力而改变。采用浸涂法制备了镧修饰锆钛酸铅体系(PLZT)薄膜。对不同大小的机械应力作用下的薄膜进行了比较。测量了介电常数、饱和极化、剩余极化、矫顽力场和d间距。讨论了外加应力对薄膜物理和电学性能的影响。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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