Scaling of All-Optical Switching to Nanometer Dimensions.

A. ElGhazaly, C. Lambert, B. Tran, A. Pattabi, J. Gorchon, S. Salahuddin, H. Wong, J. Bokor
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Abstract

Here, we first demonstrate helicity-independent all-optical switching in GdCo, a material chosen for stronger perpendicular magnetic anisotropy (PMA) than GdFeCo but with similar ferrimagnetic properties; furthermore, we achieve reliable AOS down to 200 nm diameters. The greater challenge to scaling was maintaining the perpendicular magnetic anisotropy for smaller dot dimensions, as was found to be a challenge in. While ion milling is a common method for patterning MTJ pillars for MRAM, it was found to destroy the integrity of the PMA. Instead, a lift-off process with electron -beam lithography was used to pattern the nanodots, ranging in size from 15 pm down to 50 nm, into arrays. Each dot size of diameter d was arrayed with a pitch of 3d in a25 pm x 25 pm square region. The pitch was chosen to be large enough to prevent magnetistatic coupling between the dots, while simultaneously allowing a high areal density of the dots for maximum magnetic signal during subsequent optical measurements.
全光开关的纳米尺度缩放。
在这里,我们首先展示了GdCo中与螺旋无关的全光开关,这种材料比GdFeCo具有更强的垂直磁各向异性(PMA),但具有相似的铁磁特性;此外,我们还实现了低至200nm直径的可靠AOS。缩放的更大挑战是保持较小点尺寸的垂直磁各向异性,这是在。虽然离子铣削是用于MRAM的MTJ柱图像化的常用方法,但它被发现会破坏PMA的完整性。相反,他们使用电子束光刻技术将纳米点(尺寸从15nm到50nm)制成阵列。每个直径为d的点在一个25pm x 25pm的正方形区域内以3d的间距排列。选择的间距足够大,以防止点之间的静磁耦合,同时允许点的高面密度,以便在随后的光学测量中获得最大的磁信号。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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