Keynote Address 1: "Transistors and reliability in the innovation era"

K. Mistry
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引用次数: 2

Abstract

Traditional transistor scaling drive the semiconductor industry through the 1990s, but led to the era of innovation driven transistor scaling. Strained silicon, high-k plus metal gate transistors, and fin based transistors were some of the key innovations in the last several process technology generations. This presentation will explore both the transistor scaling benefits from these innovations as well as the reliability implications covering the 90nm to 14nm timeframe.
主题演讲1:“创新时代的晶体管与可靠性”
传统的晶体管缩放驱动了整个20世纪90年代的半导体产业,但引领了创新驱动晶体管缩放的时代。应变硅、高k +金属栅极晶体管和基于翅片的晶体管是过去几代工艺技术中的一些关键创新。本报告将探讨这些创新所带来的晶体管缩放效益,以及在90纳米到14纳米时间框架内的可靠性影响。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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