X-ray diffraction investigation of the relationship between strains and metal-insulator transition in NdNiO3 thin films

P. Goudeau , P. Laffez , M. Zaghrioui , E. Elkaim , P. Ruello
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引用次数: 10

Abstract

The RNiO3 perovskites (R=rare earth) are well known for their metal to insulator transition, which temperature can be modulated by changing the nature of the rare earth. It makes this family of oxides very attractive for several applications such as thermochromic coating. In this work we have studied NdNiO3 thin films, grown on (110) NdGaO3, single crystal substrate, with different thicknesses. The temperature of the metal to insulator transition varies in the range 150 –200 K. Residual stress in films was analyzed using the sin2ψ method. Each film exhibits in plane tensile stress, their magnitude depending on the synthesis conditions. A possible relationship between the metal-insulator transition temperature and residual stress is discussed.

应变与NdNiO3薄膜金属绝缘体转变关系的x射线衍射研究
RNiO3钙钛矿(R=稀土)以其金属到绝缘体的转变而闻名,其温度可以通过改变稀土的性质来调节。这使得这类氧化物在热致变色涂层等几种应用中非常有吸引力。在这项工作中,我们研究了在(110)NdGaO3单晶衬底上生长不同厚度的NdNiO3薄膜。金属到绝缘子转变的温度在150 - 200k范围内变化。用sin2ψ法分析了薄膜中的残余应力。每一层薄膜都表现为平面拉伸应力,其大小取决于合成条件。讨论了金属-绝缘子转变温度与残余应力之间可能存在的关系。
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