Charge coloration dynamics of electrochromic amorphous tungsten oxide studied by simultaneous electrochemical and color impedance measurements

Edgar A. Rojas-González, G. Niklasson
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引用次数: 5

Abstract

The coloration mechanisms in electrochromic (EC) systems can be probed by comparing the dynamics of the electrical and optical responses. In this paper, the linear frequency-dependent electrical and optical responses of an amorphous tungsten oxide thin film were measured simultaneously by a combination of two techniques$\text{---}$that is, electrochemical impedance spectroscopy (EIS) and the so-called color impedance spectroscopy (CIS). This was done at different bias potentials, which can be associated with different intercalation levels. Equivalent circuit fitting to the EIS spectra was used to extract the Faradaic components participating in the total impedance response. The latter were assigned to an intermediate adsorption step before the intercalation and to the diffusion of the electron-ion couple in the film. A quantity denoted complex optical capacitance is compared to the complex electrical capacitance$\text{---}$in particular, their expressions are related to the Faradaic processes. The coloration at low intercalation levels followed both the adsorption and diffusion phenomena. Conversely, the diffusion contribution was dominant at high intercalation levels and the adsorption one seemed to be negligible in this case. For perfectly synchronized electrical and optical responses, their complex spectra are expected to differ only by a multiplying factor. This was the case at low intercalation levels, apart from small deviations at high frequencies. A clear departure from this behavior was observed as the intercalation level increased. A combination of frequency-dependent techniques, as presented in this work, can help in the understanding of the dynamics of the coloration mechanisms in EC materials at various conditions$\text{---}$for example, at different intercalation levels and optical wavelengths.
采用电化学和颜色阻抗同步测量方法研究了电致变色非晶氧化钨的电荷着色动力学
电致变色(EC)系统的显色机制可以通过比较电响应和光学响应的动力学来探讨。本文采用电化学阻抗谱(EIS)和色阻抗谱(CIS)两种技术的结合,同时测量了非晶氧化钨薄膜的线性频率相关的电学和光学响应。这是在不同的偏置电位下完成的,这可能与不同的插层水平有关。利用等效电路拟合EIS谱,提取参与总阻抗响应的法拉第分量。后者被分配到插入前的中间吸附步骤和薄膜中电子-离子对的扩散。将复光学电容与复电容量$\text{—}$进行比较,特别地,它们的表达式与法拉第过程有关。低插层层的着色遵循了吸附和扩散现象。相反,在高插层水平上,扩散作用占主导地位,在这种情况下,吸附作用似乎可以忽略不计。对于完全同步的电学和光学响应,它们的复杂光谱预计只相差一个乘因子。这是在低插入电平的情况,除了在高频率的小偏差。随着嵌入水平的增加,观察到这种行为明显偏离。在这项工作中提出的频率相关技术的组合可以帮助理解EC材料在不同条件下(例如,在不同的插层水平和光学波长下)的着色机制的动力学。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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