H. Heuermann, Stephan Holtrup, A. Sadeghfam, M. Schmidt, Robert Perkuhn, T. Finger
{"title":"Various applications and background of 10–200W 2.45GHz Microplasmas","authors":"H. Heuermann, Stephan Holtrup, A. Sadeghfam, M. Schmidt, Robert Perkuhn, T. Finger","doi":"10.1109/MWSYM.2012.6259386","DOIUrl":null,"url":null,"abstract":"This paper presents a microplasma ignition at 2.45GHz for various applications as well as spark plugs, plasma beams, low and high pressure lamps by using a three stage impedance transformer. The presented transformation network generates a very high voltage. Using this network, plasma ignition and sustainment are possible under atmospheric pressure, low pressure or even under very high pressure conditions. It could be shown in different tests that this concept holds true for power levels varying between 10W to 200W, offering various advantages for a variety of plasma applications at 2.45GHz.","PeriodicalId":6385,"journal":{"name":"2012 IEEE/MTT-S International Microwave Symposium Digest","volume":"21 1","pages":"1-3"},"PeriodicalIF":0.0000,"publicationDate":"2012-06-17","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"12","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2012 IEEE/MTT-S International Microwave Symposium Digest","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/MWSYM.2012.6259386","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 12
Abstract
This paper presents a microplasma ignition at 2.45GHz for various applications as well as spark plugs, plasma beams, low and high pressure lamps by using a three stage impedance transformer. The presented transformation network generates a very high voltage. Using this network, plasma ignition and sustainment are possible under atmospheric pressure, low pressure or even under very high pressure conditions. It could be shown in different tests that this concept holds true for power levels varying between 10W to 200W, offering various advantages for a variety of plasma applications at 2.45GHz.