A 78.8fJ/b/mm 12.0Gb/s/Wire Capacitively Driven On-Chip Link Over 5.6mm with an FFE-Combined Ground-Forcing Biasing Technique for DRAM Global Bus Line in 65nm CMOS

Sangyoon Lee, Jaekwang Yun, Suhwan Kim
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Abstract

Advances in virtual reality, artificial intelligence, and big data have increased demand for high-bandwidth memory. Accordingly, pre-fetch sizes have also increased with DRAM generations, meaning an increased number of global bus lines. An increase to this number is limited as it also increases the chip size; instead, the data-rate per lane can be increased for higher throughput [1]. As the global bus lines are on-chip wires in a DRAM chip, they can be driven capacitively. Prior work [2], [3] has shown the superior efficiency of capacitive drivers, over conventional repeaters, in driving on-chip wires at the cost of a reduced voltage swing. However, as there is no well-defined DC level on the capacitively-driven wires [4], wire biasing is fraught with implementation challenges [3]. To define the DC potential on the interconnect, prior work sent signals differentially [2], [4], [5] or dissipated static power to define the DC level [3]. Unfortunately, these approaches may not be preferable for DRAM chips that require dense and energy-efficient data transfers.
78.8fJ/b/mm 12.0Gb/s/线电容驱动片上链路与fe联合地强迫偏置技术在65nm CMOS DRAM全球总线线
虚拟现实、人工智能和大数据的进步增加了对高带宽内存的需求。相应地,预取大小也随着DRAM世代的增加而增加,这意味着全球总线数量的增加。这个数字的增加是有限的,因为它也增加了芯片尺寸;相反,可以提高每通道的数据速率以获得更高的吞吐量[1]。由于全球总线线路是在DRAM芯片上的片上导线,它们可以被电容驱动。先前的工作[2],[3]已经表明,在以降低电压摆动为代价驱动片上导线方面,电容驱动器比传统中继器具有更高的效率。然而,由于电容驱动导线上没有明确的直流电平[4],导线偏置在实现上充满了挑战[3]。为了确定互连上的直流电势,以前的工作通过差分发送信号[2]、[4]、[5]或耗散静功率来确定直流电平[3]。不幸的是,这些方法可能不适合需要密集和高能效数据传输的DRAM芯片。
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