Breakdown voltage enhancement for power AlGaN/GaN HEMTs with Air-bridge Field Plate

G. Xie, E. Xu, Junmin Lee, N. Hashemi, F. Y. Fu, Bo Zhang, W. Ng
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引用次数: 4

Abstract

This paper presents a breakdown voltage enhancement technique for power AlGaN/GaN HEMTs by using novel Air-bridge Field Plate (AFP). The device features a metal field plate that jumps from the source over the gate region and lands between gate and drain. Simulation results show that the HEMTs with Air-bridge Field Plate can provide a new degree of freedom to modulate the device surface electric field. In a device with gate to drain distance of 6 µm, gate length of 0.8 µm, two times higher forward blocking voltage of 450 V was obtained at VGS = −5 V when compared to a device with an optimized conventional field plate device (240 V) for a given process.
气桥场极板增强功率AlGaN/GaN hemt击穿电压
提出了一种新型气桥场极板(AFP)增强功率AlGaN/GaN hemt击穿电压的技术。该装置具有从源跃过栅极区域并落在栅极和漏极之间的金属场板。仿真结果表明,带气桥场板的hemt可以为器件表面电场的调制提供新的自由度。在给定工艺条件下,栅极到漏极距离为6µm,栅极长度为0.8µm的器件在VGS =−5 V时获得450 V的正向阻断电压,比采用优化的传统场极板器件(240 V)的器件高两倍。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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