First‐Principles Investigation of the Effect of Vanadium Doping on Hydrogen Incorporation in Tungsten

IF 1.5 4区 材料科学 Q3 CRYSTALLOGRAPHY
Zilin Cui, Xin Zhang, Yuhong Xu, Guangjiu Lei, Heng Li, Yiqin Zhu, Jun Hu, S. Geng, Qi-jun Liu, Y. Ni, Haifeng Liu, Xianqu Wang, Jie Huang, Hai Liu, Jun Cheng, Changjian Tang
{"title":"First‐Principles Investigation of the Effect of Vanadium Doping on Hydrogen Incorporation in Tungsten","authors":"Zilin Cui, Xin Zhang, Yuhong Xu, Guangjiu Lei, Heng Li, Yiqin Zhu, Jun Hu, S. Geng, Qi-jun Liu, Y. Ni, Haifeng Liu, Xianqu Wang, Jie Huang, Hai Liu, Jun Cheng, Changjian Tang","doi":"10.1002/crat.202100115","DOIUrl":null,"url":null,"abstract":"Using the first‐principles method based on the density functional theory, hydrogen diffusion, electron structure, and mechanical properties of hydrogen impurity in W15V structure are investigated in this paper. It is found that in W‐V lattice the single H atom tends to be located in the tetrahedral interstitial site nearest to V atom with the solution energy of 0.614 eV. The calculation of energy barriers shows that the V doping can be helpful to trap H atoms near the V atom. The analysis of the elastic moduli shows that the V‐alloying can decrease the strength and improve the ductility of pure W. In addition, the H impurity further enhances this situation. Besides, the effect of H impurity on pure W is greater than W15V structure. The results of this study offer a useful database for the research of W‐based alloys for plasma facing materials (PFMs).","PeriodicalId":10797,"journal":{"name":"Crystal Research and Technology","volume":"29 1","pages":""},"PeriodicalIF":1.5000,"publicationDate":"2021-08-27","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"2","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Crystal Research and Technology","FirstCategoryId":"88","ListUrlMain":"https://doi.org/10.1002/crat.202100115","RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q3","JCRName":"CRYSTALLOGRAPHY","Score":null,"Total":0}
引用次数: 2

Abstract

Using the first‐principles method based on the density functional theory, hydrogen diffusion, electron structure, and mechanical properties of hydrogen impurity in W15V structure are investigated in this paper. It is found that in W‐V lattice the single H atom tends to be located in the tetrahedral interstitial site nearest to V atom with the solution energy of 0.614 eV. The calculation of energy barriers shows that the V doping can be helpful to trap H atoms near the V atom. The analysis of the elastic moduli shows that the V‐alloying can decrease the strength and improve the ductility of pure W. In addition, the H impurity further enhances this situation. Besides, the effect of H impurity on pure W is greater than W15V structure. The results of this study offer a useful database for the research of W‐based alloys for plasma facing materials (PFMs).
钒掺杂对钨中氢掺入影响的第一性原理研究
采用基于密度泛函理论的第一性原理方法,研究了W15V结构中氢杂质的扩散、电子结构和力学性能。发现在W - V晶格中,单个H原子倾向于位于离V原子最近的四面体间隙位,其解能为0.614 eV。能量势垒的计算表明,V掺杂有助于在V原子附近捕获H原子。弹性模量分析表明,钒合金化可以降低纯钨的强度,提高其塑性,而H杂质的加入进一步增强了这一作用。此外,H杂质对纯W的影响大于W15V结构。本研究结果为等离子体表面材料用W基合金的研究提供了一个有用的数据库。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 求助全文
来源期刊
自引率
6.70%
发文量
121
审稿时长
1.9 months
期刊介绍: The journal Crystal Research and Technology is a pure online Journal (since 2012). Crystal Research and Technology is an international journal examining all aspects of research within experimental, industrial, and theoretical crystallography. The journal covers the relevant aspects of -crystal growth techniques and phenomena (including bulk growth, thin films) -modern crystalline materials (e.g. smart materials, nanocrystals, quasicrystals, liquid crystals) -industrial crystallisation -application of crystals in materials science, electronics, data storage, and optics -experimental, simulation and theoretical studies of the structural properties of crystals -crystallographic computing
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术官方微信