Предельные параметры СИС-переходов в теории и технологические возможности их достижения

Михаил Александрович Тарасов, А.А. Ломов, А. М. Чекушкин, А. А. Гунбина, М. Ю. Фоминский, C.В. Краевский, Р. К. Козулин, А.В. Шадрин
{"title":"Предельные параметры СИС-переходов в теории и технологические возможности их достижения","authors":"Михаил Александрович Тарасов, А.А. Ломов, А. М. Чекушкин, А. А. Гунбина, М. Ю. Фоминский, C.В. Краевский, Р. К. Козулин, А.В. Шадрин","doi":"10.21883/ftt.2023.07.55835.29h","DOIUrl":null,"url":null,"abstract":"Tunneling Josephson junctions of the superconductor-insulator-superconductor (SIS) type have a history of more than 50 years, and theoretical estimates of the ultimate parameters of devices for receiving and processing signals based on them look very promising. In practice, in many cases, the actually achieved parameters turn out to be much worse than the theoretical ones, so for niobium SQUIDs the characteristic voltage Vc=IcRn at best reaches 200 µV, and according to theory it should be up to 2 mV. For Terahertz SIS mixers and oscillators, the main problems are a large specific capacitance, hysteresis, and leakage currents. These problems may be related to the morphology and crystal structure of superconductor films. In practice, films are granular, tunnel barriers are nonuniform, the effective area is about 10% of geometric area, leakage currents, parasitic capacitances occur. The crystal structure determines fundamentally different properties of the same elements, for example, for carbon it is diamond, graphite, fullerenes, nanotubes. Important components of a promising superconducting technology are: the use of single-crystal substrates matched in lattice constant and orientation with the grown films, optimization of growth temperature conditions, controlled formation of an oxide or nitride tunnel barrier. One option is to use a Schottky barrier for the semiconductor interlayer instead of a dielectric or normal metal one. This review presents the results of studying films by X-ray diffraction diagnostics, atomic force microscopy, and electron microscopy, showing the main bottlenecks of the existing technology with the deposition of niobium, niobium nitride, and aluminum films on oxidized standard silicon substrates, as well as the results of quasi-epitaxial growth of films on single-crystal substrates at various temperature conditions. Reproducible manufacturing of high-quality tunnel junctions can be achieved by implementing atomically smooth surfaces of tunnel contacts, which will improve the signal and noise characteristics of superconducting devices for receiving and processing information.","PeriodicalId":24077,"journal":{"name":"Физика твердого тела","volume":"31 1","pages":""},"PeriodicalIF":0.0000,"publicationDate":"2023-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Физика твердого тела","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.21883/ftt.2023.07.55835.29h","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
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Abstract

Tunneling Josephson junctions of the superconductor-insulator-superconductor (SIS) type have a history of more than 50 years, and theoretical estimates of the ultimate parameters of devices for receiving and processing signals based on them look very promising. In practice, in many cases, the actually achieved parameters turn out to be much worse than the theoretical ones, so for niobium SQUIDs the characteristic voltage Vc=IcRn at best reaches 200 µV, and according to theory it should be up to 2 mV. For Terahertz SIS mixers and oscillators, the main problems are a large specific capacitance, hysteresis, and leakage currents. These problems may be related to the morphology and crystal structure of superconductor films. In practice, films are granular, tunnel barriers are nonuniform, the effective area is about 10% of geometric area, leakage currents, parasitic capacitances occur. The crystal structure determines fundamentally different properties of the same elements, for example, for carbon it is diamond, graphite, fullerenes, nanotubes. Important components of a promising superconducting technology are: the use of single-crystal substrates matched in lattice constant and orientation with the grown films, optimization of growth temperature conditions, controlled formation of an oxide or nitride tunnel barrier. One option is to use a Schottky barrier for the semiconductor interlayer instead of a dielectric or normal metal one. This review presents the results of studying films by X-ray diffraction diagnostics, atomic force microscopy, and electron microscopy, showing the main bottlenecks of the existing technology with the deposition of niobium, niobium nitride, and aluminum films on oxidized standard silicon substrates, as well as the results of quasi-epitaxial growth of films on single-crystal substrates at various temperature conditions. Reproducible manufacturing of high-quality tunnel junctions can be achieved by implementing atomically smooth surfaces of tunnel contacts, which will improve the signal and noise characteristics of superconducting devices for receiving and processing information.
理论和技术实现的极限参数
超导体-绝缘体-超导体(SIS)类型的隧道约瑟夫森结已经有50多年的历史,基于它们对接收和处理信号的设备最终参数的理论估计看起来很有希望。在实际应用中,很多情况下实际得到的参数会比理论参数差很多,所以对于铌squid来说,其特性电压Vc=IcRn最多只能达到200µV,理论上应该达到2 mV。对于太赫兹SIS混频器和振荡器,主要问题是大的比电容、迟滞和漏电流。这些问题可能与超导体薄膜的形貌和晶体结构有关。在实际应用中,薄膜呈粒状,隧道势垒不均匀,有效面积约为几何面积的10%,出现漏电流、寄生电容等现象。晶体结构从根本上决定了相同元素的不同性质,例如,对于碳来说,它是金刚石,石墨,富勒烯,纳米管。一种有前途的超导技术的重要组成部分是:使用与生长薄膜晶格常数和取向相匹配的单晶衬底,优化生长温度条件,控制氧化物或氮化物隧道势垒的形成。一种选择是使用肖特基势垒作为半导体中间层,而不是电介质或普通金属。本文综述了利用x射线衍射诊断、原子力显微镜和电子显微镜研究薄膜的结果,指出了现有技术在氧化标准硅衬底上沉积铌、氮化铌和铝薄膜的主要瓶颈,以及在不同温度条件下单晶衬底上准外延生长薄膜的结果。通过实现隧道触点的原子光滑表面,可以实现高质量隧道结的可重复性制造,这将改善超导器件接收和处理信息的信号和噪声特性。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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