M. Farsari, S. Huang, R. Young, M. I. Heywood, C. Chatwin
{"title":"Holographic Measurements of Photopolymers for Microstereolithography Applications","authors":"M. Farsari, S. Huang, R. Young, M. I. Heywood, C. Chatwin","doi":"10.1364/cleo_europe.1998.cthh80","DOIUrl":null,"url":null,"abstract":"In order for a resin to be suitable for stereolithographic applications, it must have a high curing speed, high build resolution and low shrinkage during the liquid to solid polymerisation process. (1). We performed nondegenerate four-wave mixing on two UV curable resins, the DuPont Somos™ 6100 and the Ciba-Geigy Ciba- tool™ SL 5180. Gratings with spatial wavelength Λ=0.3 - 1.1 µm were written using an Argon ion laser operating on the λ0=351.1 nm line and for a range of irradiance 0.5-3 W/cm2. The gratings were then read using a He-Ne laser, operating at 632.8 nm. These experiments were carried out to prove the suitability of the photopoly, nerisation systems for microstereolithography.","PeriodicalId":10610,"journal":{"name":"Conference on Lasers and Electro-Optics Europe","volume":"25 1","pages":""},"PeriodicalIF":0.0000,"publicationDate":"1998-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Conference on Lasers and Electro-Optics Europe","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1364/cleo_europe.1998.cthh80","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0
Abstract
In order for a resin to be suitable for stereolithographic applications, it must have a high curing speed, high build resolution and low shrinkage during the liquid to solid polymerisation process. (1). We performed nondegenerate four-wave mixing on two UV curable resins, the DuPont Somos™ 6100 and the Ciba-Geigy Ciba- tool™ SL 5180. Gratings with spatial wavelength Λ=0.3 - 1.1 µm were written using an Argon ion laser operating on the λ0=351.1 nm line and for a range of irradiance 0.5-3 W/cm2. The gratings were then read using a He-Ne laser, operating at 632.8 nm. These experiments were carried out to prove the suitability of the photopoly, nerisation systems for microstereolithography.