Chemical bath synthesis of metal chalcogenide films. Part 41. Hydrochemical deposition of thin films of cadmium selenide by sodium selenosulfate

A. V. Pozdin, D. D. Smirnova, L. Maskaeva, G. Rusinov, V. F. Markov
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引用次数: 1

Abstract

The group II-VI semiconductor materials including Cadmium Selenide (CdSe) thin films are widely used in many fields of science and technology, in particular in optoelectronics, nanoelectronics and solar energy. Chemical bath deposition (CBD) represents the simplest and the most available technique for deposition of semiconducting layers. CBD is characterized by deletion of toxic gaseous precursors, operation at low temperature and using of inexpensive equipment. The ionic equilibriums in reaction mixture «CdCl2 – L − Na2SeSO3» (L− NH4OH or Na3C6H5¬O7 or mixture of NH4OH and Na3C6H5¬O7 ) were calculated in present work. The prevailing cadmium complex compounds were determined in appropriate for CBD of cadmium selenide films pH range. The main complex compounds inhibiting fast formation of cadmium selenide are Cd(OH)Cit^(2-) complex (in citrat- and ammonia-citrat mixtures) and 〖Cd(NH_3)〗_5^(2+) complex (in ammonia mixture). Also the boundary conditions of forming CdSe and Cd(OH)2 in reaction mixture were determined by thermodynamic calculation based on crystallization factor to estimate the formation conditions of main (CdSe) and impurity (Cd(OH)2) phases. The results of the calculations show that the solid phase of cadmium selenide is possible to form in pH range from 10 to 14. CdSe films were grown by chemical bath deposition on glass substrates at a temperature of 353 K. The thickness of films ranges from 100 to 220 nm. The grain size of films is about 30 nm which was determined by electron microscopic investigations. The elemental composition of cadmium selenide was defined by energy dispersive analysis; the ratio of cadmium and selenium is 1.03 : 1.16. The conductivity of n-type was determined by the sign of thermoelectromotive force.
化学浴法制备金属硫族化物薄膜。41岁的一部分。硒酸钠水化学沉积硒化镉薄膜的研究
包括硒化镉(CdSe)薄膜在内的II-VI族半导体材料广泛应用于许多科学技术领域,特别是光电子、纳米电子和太阳能。化学浴沉积(CBD)是沉积半导体层的最简单和最可行的技术。CBD的特点是去除有毒的气体前体,在低温下操作,使用廉价的设备。本文计算了反应混合物“CdCl2 - L - Na2SeSO3”(L - NH4OH或Na3C6H5 - O7或NH4OH与Na3C6H5 - O7的混合物)的离子平衡。测定了硒化镉膜中主要镉络合物的适宜pH范围。抑制硒化镉快速生成的主要络合物是Cd(OH)Cit^(2-)络合物(在柠檬酸和氨-柠檬酸混合物中)和〖Cd(NH_3)〗_5^(2+)络合物(在氨混合物中)。基于结晶因子的热力学计算,确定了反应混合物中CdSe和Cd(OH)2形成的边界条件,估计了主(CdSe)相和杂质(Cd(OH)2)相的形成条件。计算结果表明,在pH值为10 ~ 14的范围内,硒化镉有可能形成固相。在353 K的温度下,用化学浴法在玻璃衬底上生长了CdSe薄膜。薄膜的厚度从100到220纳米不等。经电镜观察,薄膜的晶粒尺寸约为30 nm。用能量色散分析确定了硒化镉的元素组成;镉和硒的比例为1.03:1.16。用热电动势符号来测定n型材料的电导率。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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