Compact low current X-pinch based EUV source for lithography

Abstract

We present the results from low current X-pinch machine capable to produce the current around 50 kA with a rise time of 50 ns. The X-pinches were made from two 5-10 mum diameter wires. The emission of EUV radiation at 13.5 nm starts from less than 10 ns time corresponding to the current flow in the wires and lasts about 100 ns. Details of dynamics of the pinch were obtained from laser shadowgraphic and time integrated images, showing formation and evolution of low density coronal plasma. The emission of EUV becomes twice in amplitude at the time of pinching within few nanoseconds rise-time. The multiple peaked structure observed in time resolved EUV and x-rays signals show the pinching and the formation of hotspots between 40 - 70 ns after the start of the current, depending on the diameter of the wires. The dynamics of the low current X-pinch in the radial as well as in the axial direction were simulated using the 2D MHD code.