T. Itakura
{"title":"Cu CMP Slurry and Colloidal Chemistry","authors":"T. Itakura","doi":"10.4011/SHIKIZAI.81.341","DOIUrl":null,"url":null,"abstract":"","PeriodicalId":21870,"journal":{"name":"Shikizai Kyokaishi","volume":null,"pages":null},"PeriodicalIF":0.0000,"publicationDate":"2008-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Shikizai Kyokaishi","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.4011/SHIKIZAI.81.341","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
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