Chemical Synthesis and Characterization of Nickel Sulphide Thin Film Electrode for Supercapacitor Performances

M. Sonawane, R. Patil
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引用次数: 0

Abstract

All Nickel Sulphide thin films were deposited onto the stainless steel substrate by modified chemical bath deposition method. The structural, surface morphology were characterized by X-ray diffraction (XRD), scanning electron microscopy (SEM) respectively. The electrochemical capacitor performances were examined by using cyclic voltammetry and galvanostatic charge-discharge method. The NiS electrode exhibits a good cycling performance. The specific capacitance of 353 Fgm -1 has been obtained in 2 M KOH solution at a scan rate 50 mVs -1 within the potential range 0 to 0.8 V Vs Ag/AgCl. In charge-discharge behaviors, the maximum energy density (E) of 11.7 Whkg -1 and power density (P) of 4.3 kWkg -1 was obtained at a current density 1 mA/cm 2 . Impedance spectroscopic analysis revealed that the ESR is 5 Ω in KOH electrolyte. Keywords— Nickel Sulphide (NiS), Thin films, Cyclic voltammetry, Supercapacitor, Charge-discharge
用于超级电容器性能的硫化镍薄膜电极的化学合成与表征
采用改进的化学浴沉积法将所有的硫化镍薄膜沉积在不锈钢基体上。采用x射线衍射仪(XRD)和扫描电镜(SEM)对其结构和表面形貌进行了表征。采用循环伏安法和恒流充放电法对电化学电容器的性能进行了检测。NiS电极具有良好的循环性能。在2 M KOH溶液中,在0 ~ 0.8 V Vs Ag/AgCl电位范围内,扫描速率为50 mv -1,获得了353 Fgm -1的比电容。在充放电行为中,在电流密度为1 mA/ cm2时,获得了最大能量密度(E)为11.7 Whkg -1,功率密度(P)为4.3 kWkg -1。阻抗谱分析表明,KOH电解质的ESR为5 Ω。关键词:硫化镍,薄膜,循环伏安法,超级电容器,充放电
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