Effect of Thermal Annealing in Ammonia on the Properties of InGaN Nanowires with Different Indium Concentrations

IF 2.781
C. Hahn, A. Cordones, Sean Andrews, Hanwei Gao, Anthony Fu, S. Leone, Peidong Yang
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引用次数: 9

Abstract

The utility of an annealing procedure in ammonia ambient is investigated for improving the optical characteristics of InxGa1–xN nanowires (0.07 ≤ x ≤ 0.42) grown on c-Al2O3 using a halide chemical vapor deposition method. Morphological studies using scanning electron microscopy confirm that the nanowire morphology is retained after annealing in ammonia at temperatures up to 800 °C. However, significant indium etching and composition inhomogeneities are observed for higher indium composition nanowires (x = 0.28, 0.42), as measured by energy-dispersive X-ray spectroscopy and Z-contrast scanning transmission electron microscopy. Structural analyses, using X-ray diffraction and high-resolution transmission electron microscopy, indicate that this is a result of the greater thermal instability of higher indium composition nanowires. The effect of these structural changes on the optical quality of InGaN nanowires is examined using steady-state and time-resolved photoluminescence measurements. Annealing in ammoni...
氨热退火对不同铟浓度InGaN纳米线性能的影响
利用卤化物化学气相沉积法,研究了氨环境下退火工艺对在c-Al2O3上生长的InxGa1-xN纳米线(0.07≤x≤0.42)光学特性的改善作用。形态学研究使用扫描电子显微镜证实,纳米线形态后,在氨退火温度高达800°C后保留。然而,通过能量色散x射线光谱和z -对比扫描透射电子显微镜测量,在高铟成分纳米线(x = 0.28, 0.42)中观察到明显的铟蚀刻和成分不均匀性。利用x射线衍射和高分辨率透射电子显微镜进行的结构分析表明,这是由于铟含量高的纳米线具有更大的热不稳定性。这些结构变化对InGaN纳米线光学质量的影响通过稳态和时间分辨光致发光测量来检测。氨水退火…
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