VOLTAGE DEPENDENT MODELS OF THE FORMATIVE TIME DELAY IN ARGON

S. Stamenković, V. Marković, A. Jovanović, M. Stankov
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引用次数: 1

Abstract

Measurements of the formative time delay t_f  at different working voltages U in argon at low pressure are presented. The well-known decreasing voltage behavior of the formative time delay is theoretical described by different empirical and semiempirical models. In addition to introduced empirical models, some models from the literature are applied to elucidate experimentally obtained t_f(U) dependence. However, the models from the literature show a good agreement with the experimental data only at low overvoltages \DeltaU (\DeltaU=U-U_s where U_s is the static breakdown voltage).  Therefore, empirical corrections are made based on data analysis, and good compatibility is achieved in a whole range of working voltages. HIGHLIGHTS Presentation of the formative time delay measurements at different working voltages in argon at low pressure Application of empirical and semi-empirical models for description of t_f(U) dependence Application of the t_f(U) models from the literature with and without empirical corrections
氩气形成时间延迟的电压依赖模型
给出了在低压氩气中不同工作电压下形成时间延迟t_f的测量结果。众所周知,形成时滞的电压下降行为是由不同的经验和半经验模型在理论上描述的。除了引入的经验模型外,还应用了文献中的一些模型来阐明实验得到的t_f(U)依赖关系。然而,文献中的模型仅在低过电压\DeltaU (\DeltaU=U-U_s,其中U_s为静态击穿电压)下与实验数据吻合良好。因此,在数据分析的基础上进行了经验修正,在整个工作电压范围内实现了良好的兼容性。应用经验和半经验模型描述t_f(U)依赖关系。应用文献中的t_f(U)模型进行经验修正和不进行经验修正
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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