Screen Printed Phosphorus Dopant Paste Diffusion optimization for Silicon Solar Cell Applications

Abstract

We report the optimization of screen-printed phosphorus dopant paste diffusion on monocrystalline silicon wafers. The uniform sheet resistance and spatial selectivity offered by this diffusion approach make it promising for selective emitter, bifacial and interdigitated back contact solar cells. The sheet resistance, dopant profile and electrical characteristics of dopant paste diffused samples have been analyzed and the performance is benchmarked against conventional phosphorus oxychloride diffusion.