Substrate Temperature Effect on the Optical Properties of ZrO2 Films Prepared by Thermal Evaporation

Ahmed H. Wanas
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Abstract

The pure substance of Zirconium oxide  (ZrO2) was deposited on substrate of glass with various substrate temperatures using thermal evaporation under the pressure of (2×10-5 bar) and with a deposition rate of (0.5 nm/S) with an average thickness of (300 nm). The optical properties of these prepared films were concentrated as a function of the substrate temperature. It was found that the values ​​of each of the refractive index, packing density, together with the extinction coefficient increased with the increase in the substrate temperature of the prepared films.
衬底温度对热蒸发制备ZrO2薄膜光学性能的影响
在(2×10-5 bar)压力下,通过热蒸发将纯氧化锆(ZrO2)沉积在不同衬底温度下的玻璃衬底上,沉积速率为(0.5 nm/S),平均厚度为(300 nm)。所制备薄膜的光学性质随衬底温度的变化而集中。结果表明,随着衬底温度的升高,薄膜的折射率、堆积密度和消光系数均增大。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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