Structural And Supercapacitive Performance Of V2O5 Thin Films Prepared By DC Magnetron Sputtering

Abstract

Nanocrystalline V2O5 thin films were deposited by dc-magnetron sputtering at various substrate temperatures keeping O2 to Ar ratio at 1:8. The microstructural features were studied by XRD and Raman measurements while the surface topography and grain size of the films by AFM. The films deposited at 250 ̊C exhibited predominant (001) orientation representing the orthorhombic crystal structure with Pmmn space group. The observation of well resolved vanadyle mode at 993 cm -1 and very strong vibrational mode at 142cm -1 in Raman spectrum confirms the formation of layered like structure. The surface of the film is comprised of nanocrystallites with an average grain size of 32 nm and surface roughness of 14 nm. The V2O5 thin films deposited on Ni substrates exhibited good electrochemical performance with high specific capacitance of 238 F/g current density of 1 mAcm -2 with good cycling stability.