a-Si:H/TCO contact resistance measurement using a Kelvin cross bridge resistor

Priyaranga Koswatta, Z. Holman
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引用次数: 0

Abstract

Many have studied and reported properties of silicon heterojunctions solar cells in great detail, including open-circuit voltage and short-circuit current losses. However, little investigation has been dedicated to studying the series resistance contributions, especially at the maximum power point. Contact resistance between amorphous silicon and a transparent conductive oxide can have a significant contribution to series resistance, especially in silicon heterojunction solar cells. We propose the use of Kelvin cross bridge resistors to accurately measure the contact resistance between the doped amorphous silicon layer and the transparent conductive oxide layer typically found in a silicon heterojunction solar cell. This method allows an accurate measurement of the contact resistance without the interference of the sheet resistance of the highly resistive amorphous silicon layer.
a- si:H/TCO接触电阻测量使用开尔文交叉电桥电阻
许多人对硅异质结太阳能电池的特性进行了详细的研究和报道,包括开路电压和短路电流损耗。然而,很少有研究致力于研究串联电阻的贡献,特别是在最大功率点。非晶硅与透明导电氧化物之间的接触电阻对串联电阻有重要贡献,特别是在硅异质结太阳能电池中。我们建议使用开尔文交叉电阻器来精确测量掺杂非晶硅层与硅异质结太阳能电池中常见的透明导电氧化层之间的接触电阻。该方法允许精确测量接触电阻,而不受高电阻非晶硅层的片电阻的干扰。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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