X‐Ray White Beam Interferences on Thin Crystals

IF 1.5 4区 材料科学 Q3 CRYSTALLOGRAPHY
M. Heckert, Stefan Enghardt, J. Bauch
{"title":"X‐Ray White Beam Interferences on Thin Crystals","authors":"M. Heckert, Stefan Enghardt, J. Bauch","doi":"10.1002/crat.202100085","DOIUrl":null,"url":null,"abstract":"Results of white beam X‐ray interference measurements on almost perfect semiconductor wafers are presented. A specific measurement geometry allows for the investigation of diffraction effects on thin wafers down to at least 375 µm with a simple experimental setup (standard lab CT with microfocus X‐ray tube). Furthermore, the dynamic diffraction effect of double refraction has been studied in detail for thicker samples. This might lead to a new wafer testing method as the observed dynamic effects are very sensible on crystal quality.","PeriodicalId":10797,"journal":{"name":"Crystal Research and Technology","volume":"9 1","pages":""},"PeriodicalIF":1.5000,"publicationDate":"2021-08-06","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Crystal Research and Technology","FirstCategoryId":"88","ListUrlMain":"https://doi.org/10.1002/crat.202100085","RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q3","JCRName":"CRYSTALLOGRAPHY","Score":null,"Total":0}
引用次数: 0

Abstract

Results of white beam X‐ray interference measurements on almost perfect semiconductor wafers are presented. A specific measurement geometry allows for the investigation of diffraction effects on thin wafers down to at least 375 µm with a simple experimental setup (standard lab CT with microfocus X‐ray tube). Furthermore, the dynamic diffraction effect of double refraction has been studied in detail for thicker samples. This might lead to a new wafer testing method as the observed dynamic effects are very sensible on crystal quality.
薄晶体上的X射线白束干涉
给出了在几乎完美的半导体晶圆上进行白束X射线干涉测量的结果。通过一个简单的实验装置(带有微聚焦X射线管的标准实验室CT),特定的测量几何形状允许研究薄晶圆上至少375微米的衍射效应。此外,还对较厚样品的双折射动态衍射效应进行了详细的研究。由于观察到的动态效应对晶体质量的影响非常明显,这可能会带来一种新的晶圆测试方法。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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来源期刊
自引率
6.70%
发文量
121
审稿时长
1.9 months
期刊介绍: The journal Crystal Research and Technology is a pure online Journal (since 2012). Crystal Research and Technology is an international journal examining all aspects of research within experimental, industrial, and theoretical crystallography. The journal covers the relevant aspects of -crystal growth techniques and phenomena (including bulk growth, thin films) -modern crystalline materials (e.g. smart materials, nanocrystals, quasicrystals, liquid crystals) -industrial crystallisation -application of crystals in materials science, electronics, data storage, and optics -experimental, simulation and theoretical studies of the structural properties of crystals -crystallographic computing
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