Investigation of trap profile in nitride charge trap layer in 3-D NAND flash memory cells

Jong-Ho Lee, Ho-Jung Kang
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Abstract

We extract the trap density (Nt) profile of the nitride storage layer in 3-D NAND flash memory cells. The adjacent cells which are programmed suppress significantly the lateral diffusion during retention measurement so that we can extract accurate Nt profile. The AC-gm method makes the Nt profiling in an EC-ET range of 1∼1.2 eV possible, and provides a Gaussian Nt profile together with the retention model. The threshold voltage shift with trapped electron profiles is firstly modeled as a parameter of channel radius and its model is verified.
三维NAND快闪存储单元中氮化物电荷陷阱层陷阱轮廓的研究
我们提取了三维NAND闪存单元中氮化物存储层的陷阱密度(Nt)分布。在保留测量过程中,被编程的相邻细胞显著抑制了横向扩散,因此我们可以提取准确的Nt剖面。AC-gm方法可以在1 ~ 1.2 eV的EC-ET范围内进行Nt谱图分析,并提供高斯Nt谱图和保留模型。首先以通道半径为参数对具有捕获电子分布的阈值电压位移进行了建模,并对模型进行了验证。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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