Grain growth in nanocrystalline SnO2 prepared by sol-gel route

C.H Shek , J.K.L Lai , G.M Lin
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引用次数: 72

Abstract

The isothermal grain growth of nanocrystalline SnO2, prepared by the sol-gel route was investigated at various temperatures between 500°C and 800°C. Grain growth data were analyzed using two different models. A conventional grain growth model for polycrystalline materials yields an extremely low activation energy of 47 kJ/mol, but large grain growth exponent n from 5 to 11. These values exceed the rational region deduced from conventional theory. An alternative model is based on the assumption that the ordering of the interface regions in nanocrystalline SnO2 occurs simultaneously with grain growth by structural relaxation. This structural relaxation model describes the grain growth kinetics satisfactorily and also yields a low activation energy of 31 kJ/mol appropriate for the rearrangement of atoms.

溶胶-凝胶法制备SnO2纳米晶的晶粒生长
研究了溶胶-凝胶法制备的SnO2纳米晶在500 ~ 800℃温度下的等温晶粒生长。采用两种不同的模型对谷物生长数据进行分析。传统的多晶材料晶粒生长模型的活化能极低,只有47 kJ/mol,但晶粒生长指数n在5 ~ 11之间。这些值超出了从常规理论推导出的合理范围。另一种模型是基于这样的假设,即纳米晶体SnO2中界面区域的有序与晶粒生长同时发生,即结构弛豫。该结构松弛模型令人满意地描述了晶粒生长动力学,并产生了适合原子重排的31 kJ/mol的低活化能。
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