Band gap anomaly in single-layer Nb2SiTe4-based compounds

IF 0.8 4区 物理与天体物理 Q3 PHYSICS, MULTIDISCIPLINARY
Wang Xiao-Fei, Meng Wei-Wei, Zhao Pei-Li, Jia Shuang-Feng, Zheng He, Wang Jian-Bo
{"title":"Band gap anomaly in single-layer Nb2SiTe4-based compounds","authors":"Wang Xiao-Fei, Meng Wei-Wei, Zhao Pei-Li, Jia Shuang-Feng, Zheng He, Wang Jian-Bo","doi":"10.7498/aps.72.20222058","DOIUrl":null,"url":null,"abstract":"Two-dimensional (2D) niobium silicon telluride (Nb2SiTe4) with good stability, a narrow band gap of 0.39 eV, high carrier mobility and superior photoresponsivity, is highly desired for applications as mid-infrared (MIR) detections, ambipolar transistors. Intensive investigations on its ferroelasticity, anisotropic carrier transport, anisotropic thermoelectric property, etc., have also been reported recently. Motivated by the above prominent properties and promising applications, we have systematically studied the electronic properties of single-layer (SL) A2BX4 analogues (A=V, Nb, Ta, B=Si, Ge, Sn, X=S, Se, Te) and found a band-gap anomaly with respect to anions change, which differs from conventional 2D metal chalcogenides. In conventional binary chalcogenides, when cations keep fixed, the bandgap tends to decrease when the atomic numbers of anions in the same group increase. However, in SL A2BX4, when atomic numbers of anions increase, their bandgaps tend to increase with cations kept fixed. In order to find the underlying mechanism of such abnormal bandgap, using first-principles calculations, we have thoroughly investigated the electronic structures of Nb2SiX4 (X=S、Se、Te) as an example. It is found that the valance band maximum (VBM) and conduction band minimum (CBM) are mainly derived from the bonding and antibonding coupling between Nb 4d states. The bandwidth of Nb 4d states determines the relative value of the band gap in Nb2SiX4. We demonstrate that the band gap is largely influenced by the competition effect between Nb-Nb and Nb-X interactions in Nb2SiX4. When the anion atomic number increases, the Nb-Nb bond length also increases, yielding increased bandwidths of Nb 4d states as well as a smaller bandgap of Nb2SiX4. Meanwhile, when Nb-X bond length increases, the bandwidth of Nb 4d however decreases, yielding a larger bandgap. The interaction between Nb and X should be dominant and responsible for the overall bandgap increase of Nb2SiX4 compared with Nb-Nb interaction.","PeriodicalId":6995,"journal":{"name":"物理学报","volume":"4 1","pages":""},"PeriodicalIF":0.8000,"publicationDate":"2023-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"物理学报","FirstCategoryId":"101","ListUrlMain":"https://doi.org/10.7498/aps.72.20222058","RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q3","JCRName":"PHYSICS, MULTIDISCIPLINARY","Score":null,"Total":0}
引用次数: 0

Abstract

Two-dimensional (2D) niobium silicon telluride (Nb2SiTe4) with good stability, a narrow band gap of 0.39 eV, high carrier mobility and superior photoresponsivity, is highly desired for applications as mid-infrared (MIR) detections, ambipolar transistors. Intensive investigations on its ferroelasticity, anisotropic carrier transport, anisotropic thermoelectric property, etc., have also been reported recently. Motivated by the above prominent properties and promising applications, we have systematically studied the electronic properties of single-layer (SL) A2BX4 analogues (A=V, Nb, Ta, B=Si, Ge, Sn, X=S, Se, Te) and found a band-gap anomaly with respect to anions change, which differs from conventional 2D metal chalcogenides. In conventional binary chalcogenides, when cations keep fixed, the bandgap tends to decrease when the atomic numbers of anions in the same group increase. However, in SL A2BX4, when atomic numbers of anions increase, their bandgaps tend to increase with cations kept fixed. In order to find the underlying mechanism of such abnormal bandgap, using first-principles calculations, we have thoroughly investigated the electronic structures of Nb2SiX4 (X=S、Se、Te) as an example. It is found that the valance band maximum (VBM) and conduction band minimum (CBM) are mainly derived from the bonding and antibonding coupling between Nb 4d states. The bandwidth of Nb 4d states determines the relative value of the band gap in Nb2SiX4. We demonstrate that the band gap is largely influenced by the competition effect between Nb-Nb and Nb-X interactions in Nb2SiX4. When the anion atomic number increases, the Nb-Nb bond length also increases, yielding increased bandwidths of Nb 4d states as well as a smaller bandgap of Nb2SiX4. Meanwhile, when Nb-X bond length increases, the bandwidth of Nb 4d however decreases, yielding a larger bandgap. The interaction between Nb and X should be dominant and responsible for the overall bandgap increase of Nb2SiX4 compared with Nb-Nb interaction.
单层nb2site4基化合物的带隙异常
二维(2D)碲化铌硅(Nb2SiTe4)具有良好的稳定性,0.39 eV的窄带隙,高载流子迁移率和优异的光响应性,是中红外(MIR)探测,双极晶体管等应用的理想材料。近年来,对其铁弹性、各向异性载流子输运、各向异性热电性能等方面也进行了深入的研究。由于上述突出的性质和前景广阔的应用,我们系统地研究了单层(SL) A2BX4类似物(A=V, Nb, Ta, B=Si, Ge, Sn, X=S, Se, Te)的电子性质,并发现了与传统二维金属硫族化合物不同的阴离子变化的带隙异常。在常规的二元硫族化合物中,当阳离子保持固定时,同基团阴离子的原子序数增加,带隙有减小的趋势。而在SL A2BX4中,当阴离子原子序数增加时,其带隙趋于增大,而阳离子保持不变。为了找到这种异常带隙的潜在机制,我们利用第一性原理计算,以Nb2SiX4 (X=S, Se, Te)为例,对其电子结构进行了深入的研究。发现价带最大值(VBM)和导带最小值(CBM)主要来源于Nb - 4d态之间的成键和反键耦合。Nb - 4d态的带宽决定了Nb2SiX4中带隙的相对值。我们证明了带隙在很大程度上受Nb2SiX4中Nb-Nb和Nb-X相互作用之间竞争效应的影响。当阴离子原子序数增加时,Nb-Nb键长也增加,Nb- 4d态的带宽增加,Nb2SiX4的带隙变小。同时,随着Nb- x键长增加,Nb- 4d的带宽减小,产生更大的带隙。与Nb-Nb相互作用相比,Nb和X之间的相互作用应该是Nb2SiX4整体带隙增加的主要原因。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 求助全文
来源期刊
物理学报
物理学报 物理-物理:综合
CiteScore
1.70
自引率
30.00%
发文量
31245
审稿时长
1.9 months
期刊介绍: Acta Physica Sinica (Acta Phys. Sin.) is supervised by Chinese Academy of Sciences and sponsored by Chinese Physical Society and Institute of Physics, Chinese Academy of Sciences. Published by Chinese Physical Society and launched in 1933, it is a semimonthly journal with about 40 articles per issue. It publishes original and top quality research papers, rapid communications and reviews in all branches of physics in Chinese. Acta Phys. Sin. enjoys high reputation among Chinese physics journals and plays a key role in bridging China and rest of the world in physics research. Specific areas of interest include: Condensed matter and materials physics; Atomic, molecular, and optical physics; Statistical, nonlinear, and soft matter physics; Plasma physics; Interdisciplinary physics.
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术官方微信