Ag Ionic Memory Cell Technology for Terabit-Scale High-Density Application

S. Fujii, R. Ichihara, T. Konno, M. Yamaguchi, Harumi Seki, Hiroki Tanaka, Dandan Zhao, Y. Yoshimura, M. Saitoh, M. Koyama
{"title":"Ag Ionic Memory Cell Technology for Terabit-Scale High-Density Application","authors":"S. Fujii, R. Ichihara, T. Konno, M. Yamaguchi, Harumi Seki, Hiroki Tanaka, Dandan Zhao, Y. Yoshimura, M. Saitoh, M. Koyama","doi":"10.23919/VLSIT.2019.8776568","DOIUrl":null,"url":null,"abstract":"We demonstrated a cross-point memory array composed of 40nm Ag ionic memory cell with $\\text{sub}-\\mu \\text{A}$ and selectorless operation and 10-year data retention, making it a promising candidate for terabit-scale high-density memory application. Discontinuous conductive path with large and dense Ag clusters enabled 10-year retention even at sub-μA current with keeping high non-linearity in I-V. We implemented, for the first time, the improved cell into a 40nm cross-point array and demonstrated narrow read distribution which satisfies requirements for reliable array operation.","PeriodicalId":6752,"journal":{"name":"2019 Symposium on VLSI Technology","volume":"15 1","pages":"T188-T189"},"PeriodicalIF":0.0000,"publicationDate":"2019-06-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"7","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2019 Symposium on VLSI Technology","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.23919/VLSIT.2019.8776568","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 7

Abstract

We demonstrated a cross-point memory array composed of 40nm Ag ionic memory cell with $\text{sub}-\mu \text{A}$ and selectorless operation and 10-year data retention, making it a promising candidate for terabit-scale high-density memory application. Discontinuous conductive path with large and dense Ag clusters enabled 10-year retention even at sub-μA current with keeping high non-linearity in I-V. We implemented, for the first time, the improved cell into a 40nm cross-point array and demonstrated narrow read distribution which satisfies requirements for reliable array operation.
太比特级高密度应用银离子存储电池技术
我们展示了一种由$\text{sub}-\mu \text{a}$、无选择器操作和10年数据保留组成的40nm Ag离子存储单元组成的交叉点存储阵列,使其成为太比特级高密度存储应用的有希望的候选人。具有大而致密的银团簇的不连续导电路径即使在亚μ a电流下也能保持10年,并且在I-V电压下保持高非线性。我们首次将改进的cell实现为40nm的交叉点阵列,并证明了狭窄的读取分布,满足了阵列可靠运行的要求。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 求助全文
来源期刊
自引率
0.00%
发文量
0
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术官方微信