Optimization of the p-GaN window layer for InGaN/GaN solar cells

C. Neufeld, Zhen Chen, S. C. Cruz, N. Toledo, S. Denbaars, U. Mishra
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引用次数: 9

Abstract

In this work we report on the optimization of the p-GaN window layer for InGaN/GaN solar cells. We studied the effect of p-GaN thickness and growth temperature on the electrical performance. By optimizing the window thickness of InxGa1−xN solar cells with XIn ≈0.04 we maximized short wavelength response and produced solar cells with 82% FF and Voc of 2 V and enhancement of Jsc of 80% over un-optimized devices. We also studied the effect of growth temperature of the window layer, and found that the electrical performance was greatly improved with higher growth temperatures. By increasing the p-GaN growth temperature from 890 °C to 1040 °C, reverse bias leakage was reduced by three orders of magnitude, Voc increased from 0.85 to 1.65 V and peak output power increased by nearly 100% for devices with XIn≈0.08. Surface pit density was also significantly decreased by increasing growth temperature and seems to be an important mechanism for leakage in these devices.
InGaN/GaN太阳能电池p-GaN窗口层的优化
在这项工作中,我们报告了InGaN/GaN太阳能电池的p-GaN窗口层的优化。研究了p-GaN厚度和生长温度对其电性能的影响。通过优化XIn≈0.04的InxGa1−xN太阳电池的窗口厚度,我们最大程度地提高了短波长的响应,得到了FF为82%、Voc为2 V、Jsc比未优化器件提高80%的太阳电池。我们还研究了窗层生长温度的影响,发现随着生长温度的升高,电性能大大提高。通过将p-GaN生长温度从890℃提高到1040℃,对于XIn≈0.08的器件,反向偏置泄漏降低了三个数量级,Voc从0.85增加到1.65 V,峰值输出功率提高了近100%。表面坑密度也随着生长温度的升高而显著降低,这似乎是这些器件泄漏的重要机制。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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